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(Reference retrieved automatically from Web of Science through information on FAPESP grant and its corresponding number as mentioned in the publication by the authors.)

Thermal Annealing Influence on the Properties of Heterostructure Based on 2at.%Eu Doped SnO2 and Cu1.8S

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Author(s):
Lima, Joao V. M. [1] ; Boratto, Miguel H. [2, 3] ; dos Santos, Stevan B. O. [1] ; Scalvi, Luis V. A. [1, 2]
Total Authors: 4
Affiliation:
[1] UNESP Sao Paulo State Univ, Dept Phys, FC, Bauru, SP - Brazil
[2] UNESP, Postgrad Program Mat Sci & Technol, POSMAT, Bauru, SP - Brazil
[3] Fed Univ Santa Catarina UFSC, Dept Phys, Postgrad Program Phys, Florianopolis, SC - Brazil
Total Affiliations: 3
Document type: Journal article
Source: JOURNAL OF ELECTRONIC MATERIALS; v. 47, n. 12, p. 7463-7471, DEC 2018.
Web of Science Citations: 0
Abstract

Aiming at optoelectronic applications, a heterostructure based on Eu-doped tin oxide (SnO2) and copper sulfide (Cu2-xS) is built. SnO2 thin films doped with 2at.% Eu were obtained by the sol-gel dip-coating and spin-coating techniques, whereas the Cu2-xS film was obtained by resistive evaporation. Samples were prepared using three distinct thermal annealing temperatures of the SnO2 bottom layer: 150 degrees C, 250 degrees C and 500 degrees C. Transmittance and absorption spectra of the heterostructure shows high transparency in the visible to near infrared range (600-1800nm), and considering the dominance of SnO2 on light absorption, it was possible to evaluate the sample indirect bandgap around 3.5eV, independently of the thermal annealing temperature. Cyclic voltammetry and impedance spectroscopy, in conjunction with calculation of the hysteresis index, show that the heterostructure presents a behavior highly capacitive, and the higher annealing temperature leads to higher capacitance at low frequencies, similar to the observed qualitative behavior of supercapacitive devices. Besides, the sample with the SnO2 bottom layer annealed at 500 degrees C yielded a higher current density. (AU)

FAPESP's process: 16/16423-6 - Investigation on the oxide semiconductor SnO2, in the form of thin films, and coupling with graphene, aiming technological applications
Grantee:Stevan Brayan Oliveira dos Santos
Support Opportunities: Scholarships in Brazil - Scientific Initiation