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(Reference retrieved automatically from Web of Science through information on FAPESP grant and its corresponding number as mentioned in the publication by the authors.)

On the formation and annihilation of the singlet molecular metastables in an oxygen discharge

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Toneli, D. A. [1] ; Pessoa, R. S. [1, 2] ; Roberto, M. [1] ; Gudmundsson, J. T. [3, 4]
Total Authors: 4
[1] Techonol Inst Aeronaut, Dept Phys, BR-12228900 Sao Jose Dos Campos, SP - Brazil
[2] Paraiba Valley Univ, Inst Res & Dev, BR-12244000 Sao Jose Dos Campos, SP - Brazil
[3] Univ Iceland, Inst Sci, IS-107 Reykjavik - Iceland
[4] KTH Royal Inst Technol, Sch Elect Engn, Dept Space & Plasma Phys, SE-10044 Stockholm - Sweden
Total Affiliations: 4
Document type: Journal article
Source: JOURNAL OF PHYSICS D-APPLIED PHYSICS; v. 48, n. 32 AUG 19 2015.
Web of Science Citations: 22

We describe a volume averaged global model for an inductively coupled RF oxygen discharge that considers an extensive reaction set that includes the species: O-2(X-3 Sigma(-)(g)), O-2(a(1)Delta(g)), O-2(b(1)Sigma(+)(g)), O-2(A(3)Sigma(+)(u), A('3)Delta u, c(1)Sigma(-)(u)), O-2(+), O-2(-), O(P-3), O(D-1), O+, O-, O-3, O-3(+), O-3(-), and electrons. We propose revised rate coefficients for some of the reactions and explore the densities of various species as a function of discharge pressure, in the pressure range 1-100 mTorr. We find that the O-2(a(1)Delta(g)) density can be lower than the O-2(b(1)Sigma(+)(g)) density in the pressure range from 2.5 to 80 mTorr. The relative reaction rates for formation and annihilation of O-2(a(1)Delta(g)) and O-2(b(1)Sigma(+)(g)) are evaluated and the most important reactions are indicated. The O- loss process is also studied. The results show that O-2(a(1)Delta(g)) has only a small contribution to the loss of the negative ion O-, while electron impact detachment is a very effective loss process at low pressure (<2 mTorr) and detachment by the oxygen atom O(P-3) and the metastable singlet O-2(b(1)Sigma(+)(g)) are the most effective loss process up to roughly 50 mTorr where charge exchange becomes the most effective process for O- loss. (AU)

FAPESP's process: 13/03401-6 - Transport of magnetic field lines and particles in tokamaks and plasma modeling for deposition and etching
Grantee:Marisa Roberto
Support type: Regular Research Grants