This project deals with the growth and characterization of nanoscopic bilayers of palladium on gold on silicon and gold on palladium on silicon. The Pd and Au films, having a thickness of 10 nm, will be deposited on a buffer layer of Au and Pd, with a thickness of 100 nm, which will be deposited on single-crystal substrates of silicon (100) and (111). The following bilayers will be produced by sputtering: Pd/Au/Si(100), Pd/Au/Si(111), Au/Pd/Si(100), and Au/Pd/Si(111). The main characterization technique to be employed will be X-ray photoelectron spectroscopy (XPS). Other characterization techniques will be also used: atomic force microscopy (AFM) and X-ray diffraction (XRD).
News published in Agência FAPESP Newsletter about the scholarship: