Optical pattern generator for lithography masks and direct write
Advanced magnetic materials and new characterization techniques
Multi-User Equipment approved in the grant 2017/10581-1: total reflexion X-rays fl...
Effects of Mn and Gd incorporation on the electrical conductivity of Ga(1-x)M(x)As...
Characterization and processing of semiconductor nanostructures and application as...
Generating and mapping spin currents with space and time resolution