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Designing single metal sites stabilized by thin film surfaces through atomic layer deposition (ALD) for catalysis applications

Grant number: 19/23581-5
Support type:Scholarships abroad - Research Internship - Post-doctor
Effective date (Start): March 01, 2021
Effective date (End): February 28, 2022
Field of knowledge:Engineering - Chemical Engineering - Chemical Technology
Principal researcher:Elisabete Moreira Assaf
Grantee:Luiz Henrique Vieira
Supervisor abroad: Francisco Zaera
Home Institution: Instituto de Química de São Carlos (IQSC). Universidade de São Paulo (USP). São Carlos , SP, Brazil
Research place: University of California, Riverside (UCR), United States  
Associated to the scholarship:18/12021-6 - Partial oxidation of methane to methanol catalyzed by single-atom noble metal (Rh, Pd or Pt) supported on doped mesoporous CeO2 (Ce1-xMxO2, M = Zr, Sn or La), BP.PD


Recently materials containing atomically dispersed noble metal have shown to be an efficient and economical way to improve productivity on diverse catalytic systems. Rh and Pd single sites are found to be active to partially oxidize methane into methanol by efficiently stabilizing CH3 intermediates when related to nanoparticles. The rational design of catalysts with precisely controlled interfaces is determinant to optimize this process and advance the area. Motivated by the current scenario, this proposal of international cooperation discuss the development of single Pd sites and protective layers of ZrO2 or CuO thin films inside the porous structure of SBA-15 by applying atomic layer deposition. The technique will allow us to have an in-depth understanding and control on the formation of surfaces, increasing the homogeneity of our catalyst sites. Through the information obtained via the physical and chemical characterization of materials, by using ex situ and in situ techniques, the ideal conditions for the preparation of surfaces will be established aiming to improve the catalytic activity of these materials.

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