Study of nitrogen effect in property of the DLC film obtained by PECVD

Abstract

The great interest in the use of diamond-like-carbon films (DLC) is justified by their remarkable mechanical and tribological properties, however their high internal stress difficult the adhesion of the film with the substrate. The incorporation of nitrogen into a-C: H films causes a decrease in the amount of carbon atoms in the state of sp3 hybridization, allowing the obtainment of a film of lower hardness and lower internal stress, facilitating the adhesion of the film in the substrate. The aim of this work is to produce a-C:H(N) films in Ti6Al4V with different quantity of nitrogen and verify your effect in hardness, adhesion and thickness of the formed film. The treatment will be carried out by using plasma-enhanced chemical vapor deposition (PECVD) method without and with different quantities of N2 introduced of the treatment gas, the potency range of the 15 to 150 W and treatment time of 60 min. For the characterization of the film, the following techniques will be used: atomic force microscope (AFM), nanoindentation, profilometry, Fourier transform infrared spectroscopy (FTIR), Scanning electron microscope and RAMAN spectroscopy. Microwear abrasive test will be carried out to verify if the formed film is able to improve the tribologycal property of the studied material. (AU)