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Fabrication of MOS solar cells using structures Al/TiO2/SiO2/Si

Grant number: 16/17826-7
Support type:Scholarships in Brazil - Post-Doctorate
Effective date (Start): March 01, 2017
Effective date (End): February 28, 2019
Field of knowledge:Engineering - Electrical Engineering - Electrical Materials
Cooperation agreement: Coordination of Improvement of Higher Education Personnel (CAPES)
Principal researcher:Sebastiao Gomes dos Santos Filho
Grantee:William Chiappim Junior
Home Institution: Escola Politécnica (EP). Universidade de São Paulo (USP). São Paulo , SP, Brazil


The development of solar cells of low cost and high efficiency will have wide application in the context of distributed energy, especially for energy supplying in places isolated and far from the power grid. Moreover, solar cells offer the advantages of not consuming fossil fuel, produce no pollution or environmental contamination, have long life, are resistant to extreme weather conditions, have no moving parts requiring maintenance and they allow also the increase of the installed power by incorporating additional modules. In order to reach utmost performance, the solar cell technology must excel in three key areas: cost reduction, increased efficiency and durability. Aiming at this purpose, MOS solar cells has been receiving great attention due to its mounting simplicity and low cost. The present project is focused on manufacturing, optimization and characterization of MOS solar cells employing an alternative structure of multi layers, of the type Al/TiO2/SiO2/Si. For this purpose, theoretical and experimental studies will be performed on the Al/TiO2/SiO2 structures grown on silicon substrates with large areas (4cm x 4cm), already close to commercial dimensions. MOS solar cell prototypes will be manufactured and characterized, regarding their efficiency, using IxV and CxV measurement equipment and commercial solar simulator. The development steps include the analyses of the photovoltaic parameters (background current, short circuit current, open circuit voltage, fill factor and efficiency) for various conditions and geometry of processing aiming to optimize and obtain the best manufacturing conditions of the MOS solar cells with area up to 80cm2 on 4inches silicon wafers. (AU)

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Scientific publications
(References retrieved automatically from Web of Science and SciELO through information on FAPESP grants and their corresponding numbers as mentioned in the publications by the authors)
DIAS, V. M.; CHIAPPIM, W.; FRAGA, M. A.; MACIEL, H. S.; MARCIANO, F. R.; PESSOA, R. S.. Atomic layer deposition of TiO2 and Al2O3 thin films for the electrochemical study of corrosion protection in aluminum alloy cans used in beverage. MATERIALS RESEARCH EXPRESS, v. 7, n. 7, . (18/01265-1, 14/18139-8, 16/17826-7)
CHIAPPIM, WILLIAM; WATANABE, MARCOS; DIAS, VANESSA; TESTONI, GIORGIO; RANGEL, RICARDO; FRAGA, MARIANA; MACIEL, HOMERO; DOS SANTOS FILHO, SEBASTIAO; PESSOA, RODRIGO. MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion. NANOMATERIALS, v. 10, n. 2, . (18/01265-1, 15/05956-0, 11/50773-0, 15/10876-6, 16/17826-7)
CHIAPPIM, WILLIAM; FRAGA, MARIANA AMORIM; MACIEL, HOMERO SANTIAGO; PESSOA, RODRIGO SAVIO. An Experimental and Theoretical Study of the Impact of the Precursor Pulse Time on the Growth Per Cycle and Crystallinity Quality of TiO2 Thin Films Grown by ALD and PEALD Technique. FRONTIERS IN MECHANICAL ENGINEERING-SWITZERLAND, v. 6, . (16/17826-7, 18/01265-1, 11/50773-0)

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