Although antibiotics residues had been found at low concentrations, some studies have reported the promotion of bacterial resistance to pathogens. Therefore, the study of processes that promote degradation of this emerging pollutant degradation is necessary. In this context, this project aims to study the photodegradation of two antibiotics and its residues in aqueous solutions by advanced oxidation process (AOP) (H2O2/UV and photo-Fenton). The measurement of antibiotics concentration and identification of degradation products will be carried out using high performance liquid chromatography coupled to mass spectrometry (LC-MS). The organic matter removal will be followed by Total Organic Carbon (TOC) analysis. Taking into account the degradation process of antibiotics will be carried out in aqueous solution containing the contaminant at different concentration levels, in this work solid phase extraction (SPE) technique will be used. Degradation routes of antibiotics during reaction with hydroxyl radicals will be proposed. It is intended stabilize iron species in the presence of bio-organic surfactants (BOS) during antibiotics photo-oxidation by photo-Fenton process, enabling disposal of this solution without prior pH adjustment. This project also aims to establish scientific research cooperation between the Chemical Systems Engineering Center (CESQ/PQI-EPUSP) and the University of California, as a result of the researcher's training at the foreign institution, also contributing to her international insertion.
News published in Agência FAPESP Newsletter about the scholarship: