Scholarship 08/10430-4 - Pulverização catódica, Semicondutores - BV FAPESP
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Deposition Process Optimization of TiO2:Mn Films using RF Magnetron Sputtering

Grant number: 08/10430-4
Support Opportunities:Scholarships in Brazil - Doctorate
Start date: March 01, 2009
End date: August 31, 2012
Field of knowledge:Engineering - Materials and Metallurgical Engineering - Nonmetallic Materials
Principal Investigator:Jose Humberto Dias da Silva
Grantee:André Luis de Jesus Pereira
Host Institution: Faculdade de Ciências (FC). Universidade Estadual Paulista (UNESP). Campus de Bauru. Bauru , SP, Brazil
Associated research grant:07/08072-0 - Fundamental research in superconductivity and magnetism - systems potentially useful for aplications: advanced oxides and superconductors patterned with artificial structures, AP.TEM
News published in Agência FAPESP Newsletter about the scholarship:
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Articles published in other media outlets ( ):
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VEICULO: TITULO (DATA)
VEICULO: TITULO (DATA)

Scientific publications
(References retrieved automatically from Web of Science and SciELO through information on FAPESP grants and their corresponding numbers as mentioned in the publications by the authors)
PEREIRA, ANDRE L. J.; GRACIA, LOURDES; BELTRAN, ARMANDO; LISBOA-FILHO, PAULO N.; DA SILVA, JOSE H. D.; ANDRES, JUAN. Structural and Electronic Effects of Incorporating Mn in TiO2 Films Grown by Sputtering: Anatase versus Rutile. Journal of Physical Chemistry C, v. 116, n. 15, p. 8753-8762, . (08/10430-4, 07/08072-0)
Academic Publications
(References retrieved automatically from State of São Paulo Research Institutions)
PEREIRA, André Luis de Jesus. Otimização do processo de deposição de filmes TiO2:Mn usando RF magnetron sputtering. 2012. Doctoral Thesis - Universidade Estadual Paulista (Unesp). Faculdade de Ciências. Bauru Bauru.

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