Infrastructure improvements in the Center for Semiconductor Components for the development of micro and nano fabrication technology

Abstract

To increase the demands on nanotechnology, the financial supports from FAPESP projects, 2010/08822-1 (regular project) and 2009/54064-4 (thematic project), for the CCS /UNICAMP have allowed a better performance in the FIB (Focused long Beam) system and the installation of a electron beam lithography system (Raith E-line plus) that can get structures on substrates with a size of 20 nm, respectively. Both projects have generated an institutional technical reserves by the FAPESP approximately R$ 215.000,00 (two hundred and fifteen thousand reais). Thus, this proposal for use of Institutional Technical Reserve (ITR) is to provide the justification for the use of this reserve and the budget of how this money will be used. (AU)