Advanced search
Start date
Betweenand
Related content

Center of excellence in physics and applications of plasmas

Grant number: 11/50773-0
Support Opportunities:Research Projects - Thematic Grants
Duration: February 01, 2012 - May 31, 2016
Field of knowledge:Physical Sciences and Mathematics - Physics - Physics of Fluids, Plasma Physics and Electrical Discharge
Convênio/Acordo: CNPq - Pronex
Principal Investigator:Ricardo Magnus Osório Galvão
Grantee:Ricardo Magnus Osório Galvão
Host Institution: Instituto de Física (IF). Universidade de São Paulo (USP). São Paulo , SP, Brazil
Pesquisadores principais:
( Últimos )		Homero Santiago Maciel ; Marcos Massi
Pesquisadores principais:
( Antigos )		Choyu Otani
Associated grant(s):16/02230-1 - Development of impurity transport models to implement them in astra code for TCABR, AV.EXT
16/07259-8 - European Physical Society 43rd Conference on Plasma Physics, AR.EXT
15/22376-8 - Geodesic mode instability driven by electron and ion fluxes in tokamaks, PUB.ART
 + associated grants 15/05956-0 - 15th International Conference on Atomic Layer Deposition, AR.EXT
14/06685-8 - 41st EPS Conference on Plasma Physics, AR.EXT
14/01104-7 - The International Conference on Metallurgical Coatings and Thin Films (41st ICMCTF), AR.EXT
13/20652-2 - Plasma turbulence and MHD instabilities in the ohmic L-mode and bias H -mode regimes of the TCABR tokamak, AV.EXT
12/07027-9 - 39th European Physical Society Conference on Plasma Physics 16th International Congress on Plasma Physics, AR.EXT - associated grants
Associated scholarship(s):16/01576-1 - Studies of cold plasmas applied in etching process of semiconductor material using computer simulation and experimental methods, BP.IC
15/10876-6 - Plasma-fungal biofilm interaction: diagnostic of the plasma and inactivation process of the Candida spp strains, BP.DR
14/03308-9 - Alfvén wave theory in tokamaks, BP.MS
 + associated scholarships 13/24387-1 - Reflectometry and localization of plasma density perturbation in TCABR tokamak, BP.IC
13/05269-8 - Development, characterization and qualification of carbon materials synthesized by CVD and PECVD techniques, BP.DD
12/22830-2 - Geodesic Acoustic Modes and Alfvén Continuum in Plasma Columns with Rotation, BP.DR
12/03593-0 - Study of TiOxNy coatings of the photo-electrode of a photoelectrochemical cell applied for hydrogen generation from water, BP.IC - associated scholarships

Abstract

The establishment of a “Center of Excellence” to carry out advanced scientific and technological research in plasma physics and its applications is proposed. The center will be formed by a consortium of research groups from three main institutions, the Institute of Physics of the University of São Paulo, the Technical Institute of Aeronautics, and the Institute for Research and Development of the University of the Paraiba Valley. The research program of the Center will be concentrated in two main lines: (i) anomalous transport and Alfvén waves in thermonuclear plasmas and (ii) application of plasmas in material processing and assisted combustion. The research groups that participate in this proposal have produced quite relevant work in these lines, but not in an articulated manner. Since they have many overlapping areas and employ similar theoretical models and experimental techniques, the articulation of the activities of these groups in the context of a Center will have a strong synergetic effect, in particular in the training of young scientists, strengthening of international collaborations, and transference of by products of the research activities to the industrial sector. (AU)

Articles published in Pesquisa FAPESP Magazine about the research grant:
High frequency 
Alta frecuencia 
Articles published in Agência FAPESP Newsletter about the research grant:
TITULO 
Articles published in other media outlets (0 total):
More itemsLess items
VEICULO: TITULO (DATA)
VEICULO: TITULO (DATA)

Scientific publications (45)
(References retrieved automatically from Web of Science and SciELO through information on FAPESP grants and their corresponding numbers as mentioned in the publications by the authors)
ABRÃO CHIARANDA MERIJ; TARCILA SUGAHARA; GISLENE VALDETE MARTINS; ARGEMIRO SOARES DA SILVA SOBRINHO; DANIELI APARECIDA PEREIRA REIS; POLYANA ALVES RADI GONÇALVES; MARCOS MASSI. Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS. MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS, v. 18, n. 5, p. 904-907, . (11/50773-0)
TEZANI, L. L.; PESSOA, R. S.; MORAES, R. S.; MEDEIROS, H. S.; MARTINS, C. A.; MACIEL, H. S.; PETRACONI FILHO, G.; MASSI, M.; DA SILVA SOBRINHO, A. S.. Automation of a Mass Flow Controller for Application in Time-Multiplex SF6+CH4 Plasma Etching of Silicon. CONTRIBUTIONS TO PLASMA PHYSICS, v. 52, n. 9, p. 735-743, . (11/50773-0)
TEZANI, L. L.; PESSOA, R. S.; MACIEL, H. S.; PETRACONI, G.. Chemistry studies of SF6/CF4, SF6/O-2 and CF4/O-2 gas phase during hollow cathode reactive ion etching plasma. VACUUM, v. 106, p. 64-68, . (11/50773-0)
PESSOA, R. S.; FRAGA, M. A.; SANTOS, L. V.; MASSI, M.; MACIEL, H. S.. Nanostructured thin films based on TiO2 and/or SiC for use in photoelectrochemical cells: A review of the material characteristics, synthesis and recent applications. MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, v. 29, p. 56-68, . (11/50773-0)
PUGLIA, P. G. P. P.; ELFIMOV, A. G.; RUCHKO, L. F.; GALVAO, R. M. O.; GUIMARAES-FILHO, Z.; RONCHI, G.; TEAM, TCABR. Externally driven global Alfven eigenmodes applied for effective mass number measurement on TCABR. Physics of Plasmas, v. 21, n. 12, . (11/50773-0)
SANTOS, EVERTON D.; LUQUETA, GERSON R.; ABDALA, JULIA M. A.; RAMU, RAJASEKARAN; ESPOSITO, ELISA; REZENDE, LEANDRO B.; VIEIRA, LUCIA; MILTON, JR., B.. Antimicrobial silver coating using PVD-PECVD system. INDIAN JOURNAL OF FIBRE & TEXTILE RESEARCH, v. 45, n. 2, p. 197-206, . (11/50773-0, 13/05269-8)
DIAS, VANESSA; MACIEL, HOMERO; FRAGA, MARIANA; LOBO, ANDERSON O.; PESSOA, RODRIGO; MARCIANO, FERNANDA R.. Atomic Layer Deposited TiO2 and Al2O3 Thin Films as Coatings for Aluminum Food Packaging Application. MATERIALS, v. 12, n. 4, . (14/18139-8, 11/50773-0, 11/17877-7, 12/15857-1, 11/20345-7, 16/00575-1, 15/05956-0, 15/09697-0, 18/01265-1, 15/10876-6)
RONCHI, G.; SEVERO, J. H. F.; SALZEDAS, F.; GALVAO, R. M. O.; SANADA, E. K.. Interplay between intrinsic plasma rotation and magnetic island evolution in disruptive discharges. PLASMA PHYSICS REPORTS, v. 42, n. 5, p. 465-471, . (11/50773-0)
EVERTON DINIZ DOS SANTOS; GERSON LUQUETA; RAMU RAJASEKARAN; THAISA BAESSO DOS SANTOS; ANELISE CRISTINA OSORIO CESAR DORIA; POLYANA ALVES RADI; RODRIGO SAVIO PESSOA; LUCIA VIEIRA; HOMERO SANTIAGO MACIEL. Macrophages adhesion rate on Ti-6Al-4V substrates: polishing and DLC coating effects. Res. Biomed. Eng., v. 32, n. 2, p. 144-152, . (13/05269-8, 11/50773-0)
ANELISE CRISTINA OSÓRIO CESAR DORIA; CAMILA DI PAULA COSTA SORGE; THAISA BAESSO SANTOS; JHONATAN BRANDÃO; POLYANA ALVES RADI GONÇALVES; HOMERO SANTIAGO MACIEL; SÔNIA KHOURI; RODRIGO SÁVIO PESSOA. Application of post-discharge region of atmospheric pressure argon and air plasma jet in the contamination control of Candida albicans biofilms. Res. Biomed. Eng., v. 31, n. 4, p. 358-362, . (15/10876-6, 11/50773-0)
ELFIMOV, A. G.. Geodesic mode spectrum modified by the energetic particles in tokamak plasmas. Physics Letters A, v. 378, n. 47, p. 3533-3536, . (11/50773-0)
MERIJ, ABRAO CHIARANDA; SUGAHARA, TARCILA; MARTINS, GISLENE VALDETE; DA SILVA SOBRINHO, ARGEMIRO SOARES; PEREIRA REIS, DANIELI APARECIDA; RADI GONCALVES, POLYANA ALVES; MASSI, MARCOS. Use of Cr Inter layer to Promote the Adhesion of SIC Films Deposited on Ti-6Al-4V by HiPIMS. MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS, v. 18, n. 5, p. 904-907, . (11/50773-0)
CHIAPPIM, W.; TESTONI, G. E.; DORIA, A. C. O. C.; PESSOA, R. S.; FRAGA, M. A.; GALVAO, N. K. A. M.; GRIGOROV, K. G.; VIEIRA, L.; MACIEL, H. S.. Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O-2 plasma power, precursor chemistry and plasma exposure mode. Nanotechnology, v. 27, n. 30, . (11/50773-0, 15/05956-0, 15/10876-6)
CHIAPPIM, W.; TESTONI, G. E.; MORAES, R. S.; PESSOA, R. S.; SAGAS, J. C.; ORIGO, F. D.; VIEIRA, L.; MACIEL, H. S.. Structural, morphological, and optical properties of TiO2 thin films grown by atomic layer deposition on fluorine doped tin oxide conductive glass. VACUUM, v. 123, p. 91-102, . (11/50773-0, 15/05956-0)
GONICHE, M.; DUMONT, R.; BOURDELLE, C.; DECKER, J.; DELPECH, L.; EKEDAHL, A.; GUILHEM, D.; GUIMARAES-FILHO, Z.; LITAUDON, X.; LOTTE, PH; et al. Advances in long pulse operation at high radio frequency power in Tore Supra. Physics of Plasmas, v. 21, n. 6, . (11/50773-0)
PESSOA, R. S.; SAGAS, J. C.; RODRIGUES, B. V. M.; GALVAO, N. K. A. M.; FRAGA, M. A.; PETRACONI, G.; MACIEL, H. S.. Experimental Studies on Low-Pressure Plane-Parallel Hollow Cathode Discharges. Brazilian Journal of Physics, v. 48, n. 4, p. 411-420, . (11/50773-0)
ELFIMOV, A. G.. Geodesic mode instability driven during ion cyclotron heating in tokamaks. Physics of Plasmas, v. 25, n. 6, . (11/50773-0)
DOWSON, S.; DORLING, S.; SHEIKH, H. K.; BLACKMAN, T.; JONES, G.; GOODYEAR, A.; PUGLIA, P.; BLANCHARD, P.; FASOLI, A.; TESTA, D.; et al. The JET upgraded toroidal Alfven Eigenmode Diagnostic System. FUSION ENGINEERING AND DESIGN, v. 146, n. B, SI, p. 2639-2643, . (11/50773-0)
DE ALMEIDA MARIBONDO GALVAO, NIERLLY KARINNI; DE VASCONCELOS, GETULIO; RIBEIRO DOS SANTOS, MARCOS VALENTIM; BASTOS CAMPOS, TIAGO MOREIRA; PESSOA, RODRIGO SAVIO; GUERINO, MARCIEL; DJOUADI, MOHAMED ABDOU; MACIEL, HOMERO SANTIAGO. Growth and Characterization of Graphene on Polycrystalline SiC Substrate Using Heating by CO2 Laser Beam. MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS, v. 19, n. 6, p. 1329-1334, . (11/50773-0, 11/07468-2)
RADI, POLYANA ALVES; VIEIRA, ANGELA; MANFROI, LUCAS; DE FARIAS NASS, KARINA CARVALHO; RAMIREZ RAMOS, MARCO ANTONIO; LEITE, PRISCILA; MARTINS, GISLENE VALDETE; FREIRE JOFRE, JORGE BENEDITO; VIEIRA, LUCIA. Tribocorrosion and corrosion behavior of stainless steel coated with DLC films in ethanol with different concentrations of water. CERAMICS INTERNATIONAL, v. 45, n. 7, B, p. 9686-9693, . (11/50773-0, 08/05533-9)
MENDONCA, J. T.; FEDELE, R.. Photon mirror acceleration in the quantum regime. Physics of Plasmas, v. 21, n. 12, . (11/50773-0)
SEVERO, J. H. F.; RONCHI, G.; GALVAO, R. M. O.; NASCIMENTO, I. C.; GUIMARAES-FILHO, Z. O.; KUZNETSOV, YU. K.; NAVE, M. F. F.; OLIVEIRA, A. M.; DO NASCIMENTO, F.; TENDLER, M.. Investigation of rotation at the plasma edge in TCABR. NUCLEAR FUSION, v. 55, n. 9, . (11/50773-0, 14/13296-8)
ALBARRACIN MANRIQUE, MARCOS A.; RUCHKO, L.; PIRES, C. J. A.; GALVAO, R. M. O.; ELFIMOV, A. G.. Optimization of Antenna Current Feeding for the Alfv,n Eigenmodes Active Diagnostic System of JET. Brazilian Journal of Physics, v. 48, n. 2, p. 146-154, . (11/50773-0)
GALVAO, NIERLLY; GUERINO, MARCIEL; CAMPOS, TIAGO; GRIGOROV, KORNELI; FRAGA, MARIANA; RODRIGUES, BRUNO; PESSOA, RODRIGO; CAMUS, JULIEN; DJOUADI, MOHAMMED; MACIEL, HOMERO. The Influence of AlN Intermediate Layer on the Structural and Chemical Properties of SiC Thin Films Produced by High-Power Impulse Magnetron Sputtering. MICROMACHINES, v. 10, n. 3, . (18/01265-1, 11/50773-0, 14/18139-8)
CHIAPPIM, WILLIAM; WATANABE, MARCOS; DIAS, VANESSA; TESTONI, GIORGIO; RANGEL, RICARDO; FRAGA, MARIANA; MACIEL, HOMERO; DOS SANTOS FILHO, SEBASTIAO; PESSOA, RODRIGO. MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion. NANOMATERIALS, v. 10, n. 2, . (18/01265-1, 15/05956-0, 11/50773-0, 15/10876-6, 16/17826-7)
CHIAPPIM, WILLIAM; FRAGA, MARIANA AMORIM; MACIEL, HOMERO SANTIAGO; PESSOA, RODRIGO SAVIO. An Experimental and Theoretical Study of the Impact of the Precursor Pulse Time on the Growth Per Cycle and Crystallinity Quality of TiO2 Thin Films Grown by ALD and PEALD Technique. FRONTIERS IN MECHANICAL ENGINEERING-SWITZERLAND, v. 6, . (16/17826-7, 18/01265-1, 11/50773-0)
STEGEMANN, C.; MORAES, R. S.; DUARTE, D. A.; MASSI, M.. Thermal annealing effect on nitrogen-doped TiO2 thin films grown by high power impulse magnetron sputtering plasma power source. Thin Solid Films, v. 625, p. 49-55, . (11/50773-0)
CHIAPPIM, W.; TESTONI, G. E.; DE LIMA, J. S. B.; MEDEIROS, H. S.; PESSOA, RODRIGO SAVIO; GRIGOROV, K. G.; VIEIRA, L.; MACIEL, H. S.. Effect of Process Temperature and Reaction Cycle Number on Atomic Layer Deposition of TiO2 Thin Films Using TiCl4 and H2O Precursors: Correlation Between Material Properties and Process Environment. Brazilian Journal of Physics, v. 46, n. 1, p. 56-69, . (11/50773-0, 15/05956-0)
NASS, K. C. F.; RADI, P. A.; LEITE, D. M. G.; MASSI, M.; DA SILVA SOBRINHO, A. S.; DUTRA, R. C. L.; VIEIRA, L.; REIS, D. A. P.. Tribomechanical and structural properties of a-SiC:H films deposited using liquid precursors on titanium alloy. SURFACE & COATINGS TECHNOLOGY, v. 284, p. 240-246, . (11/50773-0)
LEAL, G.; FRAGA, M. A.; RASIA, L. A.; MASSI, M.. Impact of high N-2 flow ratio on the chemical and morphological characteristics of sputtered N-DLC films. SURFACE AND INTERFACE ANALYSIS, v. 49, n. 2, p. 99-106, . (14/18139-8, 11/50773-0, 13/17045-7)
M.A. FRAGA; R. S. PESSOA; M. MASSI; H. S. MACIEL. Carbeto de Silício como Material Base para Sensores MEMS de Uso Aeroespacial: Uma Visão Geral. MATERIA-RIO DE JANEIRO, v. 19, n. 3, p. 274-290, . (11/50773-0)
SAGAS, JULIO CESAR; PESSOA, RODRIGO SAVIO; MACIEL, HOMERO SANTIAGO. Langmuir Probe Measurements in a Grid-Assisted Magnetron Sputtering System. Brazilian Journal of Physics, v. 48, n. 1, p. 61-66, . (11/50773-0)
NEVES, D. V. F.; DA SILVA SOBRINHO, A. S.; MASSI, M.; GONZALEZ-CARRASCO, J. L.; LIEBLICH, M.; CARDOSO, K. R.. Growth and surface characterization of FeAlCr thin films deposited by magnetron sputtering for biomedical applications. Thin Solid Films, v. 608, p. 71-78, . (11/50773-0)
TESTONI, G. E.; CHIAPPIM, W.; PESSOA, R. S.; FRAGA, M. A.; MIYAKAWA, W.; SAKANE, K. K.; GALVAO, N. K. A. M.; VIEIRA, L.; MACIEL, H. S.. Influence of the Al2O3 partial-monolayer number on the crystallization mechanism of TiO2 in ALD TiO2/Al2O3 nanolaminates and its impact on the material properties. JOURNAL OF PHYSICS D-APPLIED PHYSICS, v. 49, n. 37, . (11/50773-0, 15/05956-0)
MENDONCA, J. T.; HORTON, W.; GALVAO, R. M. O.; ELSKENS, YVES. Transport equations for lower hybrid waves in a turbulent plasma. JOURNAL OF PLASMA PHYSICS, v. 81, n. 2, . (11/50773-0)
PESSOA, R. S.; DOS SANTOS, V. P.; CARDOSO, S. B.; DORIA, A. C. O. C.; FIGUEIRA, F. R.; RODRIGUES, B. V. M.; TESTONI, G. E.; FRAGA, M. A.; MARCIANO, F. R.; LOBO, A. O.; et al. TiO2 coatings via atomic layer deposition on polyurethane and polydimethylsiloxane substrates: Properties and effects on C. albicans growth and inactivation process. Applied Surface Science, v. 422, p. 73-84, . (11/50773-0, 12/15857-1, 11/17877-7, 11/20345-7, 15/10876-6, 15/09697-0, 15/08523-8, 16/00575-1, 15/05956-0)
PUGLIA, P. G. P.; ELFIMOV, A. G.; ANDRIATI, A. V.; GALVAO, R. M. O.; GUIMARAES-FILHO, Z. O.; RONCHI, G.; RUCHKO, L. F.. Mass number identification by Alfven wave diagnostics in hydrogen and helium plasmas in TCABR. Physics Letters A, v. 380, n. 11-12, p. 1189-1192, . (11/50773-0)
MENDONCA, J. T.; HAAS, F.; BRET, A.. Influence of flavor oscillations on neutrino beam instabilities. Physics of Plasmas, v. 21, n. 9, . (11/50773-0)
DUARTE, D. A.; MASSI, M.; SAGAS, J. C.; DA SILVA SOBRINHO, A. S.; IRALA, D. R.; FONTANA, L. C.. Hysteresis-free deposition of TiOxNy thin films: Effect of the reactive gas mixture and oxidation of the TiN layers on process control. VACUUM, v. 101, n. SI, p. 200-204, . (11/50773-0)
RADI, POLYANA ALVES; TESTONI, GIORGIO ERNESTO; PESSOA, RODRIGO SAVIO; MACIEL, HOMERO SANTIAGO; ROCHA, LUIS AUGUSTO; VIEIRA, LUCIA. Tribocorrosion behavior of TiO2/Al2O3 nanolaminate, Al2O3, and TiO2 thin films produced by atomic layer deposition. SURFACE & COATINGS TECHNOLOGY, v. 349, p. 1077-1082, . (11/50773-0, 08/05533-9)
GALVAO, NIERLLY; VASCONCELOS, GETULIO; PESSOA, RODRIGO; MACHADO, JOAO; GUERINO, MARCIEL; FRAGA, MARIANA; RODRIGUES, BRUNO; CAMUS, JULIEN; DJOUADI, ABDOU; MACIEL, HOMERO. A Novel Method of Synthesizing Graphene for Electronic Device Applications. MATERIALS, v. 11, n. 7, . (11/50773-0, 18/01265-1, 14/18139-8, 17/18826-3)
TINGUELY, R. A.; PUGLIA, P. G.; FIL, N.; DOWSON, S.; PORKOLAB, M.; DVORNOVA, A.; FASOLI, A.; FITZGERALD, M.; GUILLEMOT, V; HUYSMANS, G. T. A.; et al. Experimental studies of plasma-antenna coupling with the JET Alfven Eigenmode Active Diagnostic. NUCLEAR FUSION, v. 61, n. 2, . (11/50773-0)
R. S. DE OLIVEIRA; H. A. FOLLI; C. STEGEMANN; I. M. HORTA; B. S. DAMASCENO; W. MIYAKAWA; A. L. J. PEREIRA; M. MASSI; A. S. DA SILVA SOBRINHO; D. M. G. LEITE. Structural, Morphological, Vibrational and Optical Properties of GaN Films Grown by Reactive Sputtering: The Effect of RF Power at Low Working Pressure Limit. MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS, v. 25, . (15/06241-5, 11/50773-0)

Please report errors in scientific publications list by writing to: cdi@fapesp.br.
Filed patent(s) as a result of this research project

APARATO PARA REATOR A PLASMA, PROCESSO DE DEPOSIÇÃO DE REVESTIMENTO DE FILME DE CARBONO PELO USO DO REFERIDO APARATO E CORRESPONDENTE FILME OBTIDO BR1020140323740 - Instituto Tecnológico de Aeronáutica (ITA) ; Universidade do Vale do Paraíba (UNIVAP) . Lucia Vieira; Marcos Massi; Argemiro Soares da Silva Sobrinho; Homero Santiago Maciel; Rodrigo Sávio Pessoa; Sara Fernanda Fissmer; Leandro Lameirão Ferreira; Polyana Alves Radi Gonçalves - December 2014, 23