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Multiuser equipment approved in grant 2012/50259-8: atomic layer deposition

Abstract

This equipment allows the manufacture of electro-optical devices using thin film deposition technique of atomic thickness. With it, it will be possible to deposit dielectric layers of the order of a few nanometers in capacitive structures based on two-dimensional materials. (AU)

Articles published in Agência FAPESP Newsletter about the research grant:
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VEICULO: TITULO (DATA)
VEICULO: TITULO (DATA)